Investigation on doping behavior of Ho ions in Lu2SiO5 lattice by XRD Rietveld refinement and first-principles calculations
用户Yp_OBjdIs_-8
10天前
34
10
已关闭
DOI: 10.1016/j.jssc.2023.124505
文献链接: https://linkinghub.elsevier.com/retrieve/pii/S0022459623006734
其他信息:
出版社: Elsevier BV
作者: Xue Zhang; Chenyun Zhang; Xuefeng Wang; Ying Shi